Deposition of lanthanum zirconium oxide high- κ films by liquid injection atomic layer deposition

Applied Physics Letters

Volumn 91, Issue 11, 2007, Pages

  Gaskell, J M ^a   Jones, A C ^a   Aspinall, H C ^a   Taylor, S ^a   Taechakumput, P ^a   Chalker, P R ^a   Heys, P N ^b   Odedra, R ^b  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b SAFC Hitech   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC LAYER DEPOSITION; CURRENT DENSITY; LANTHANUM COMPOUNDS; LEAKAGE CURRENTS; PERMITTIVITY; VOLTAGE CONTROL;

ATOMIC FRACTIONS; HYSTERESIS VOLTAGES; VOLTAGE SHIFTS;

THIN FILMS;

EID: 34548671637     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2784956     Document Type: Article

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