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Volumn 310, Issue 16, 2008, Pages 3890-3895

Correlation between the oxygen content and the morphology of AlN films grown by r.f. magnetron sputtering

Author keywords

A1. Crystal morphology; A1. Defects; A3. Physical vapor deposition processes; B1. Nitrides; B2. Semiconducting III V materials

Indexed keywords

ALUMINUM; CRYSTALLOGRAPHY; MAGNETRON SPUTTERING; MAGNETRONS; MINERALOGY; MORPHOLOGY; PRESSURE; SPUTTER DEPOSITION; THICK FILMS; VAPOR DEPOSITION;

EID: 48049091360     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.06.021     Document Type: Article
Times cited : (44)

References (40)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.