Aluminum oxynitride coatings for oxidation resistance of epoxy films

Surface and Coatings Technology

Volumn 155, Issue 2-3, 2002, Pages 130-135

  Ianno, N J ^a   Enshashy, H ^a   Dillon, R O ^a  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

Aluminum; Atomic force microscopy; Nitrides; Oxides; Reactive sputtering; X ray diffraction

Indexed keywords

ALUMINUM NITRIDE; ATOMIC FORCE MICROSCOPY; ELECTRON CYCLOTRON RESONANCE; ELECTRON MICROSCOPY; OXIDATION RESISTANCE; SILICON; SPUTTER DEPOSITION; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

EPOXY FILMS;

PROTECTIVE COATINGS;

COATING; CORROSION RESISTANCE; EPOXY PAINT SYSTEM; MICROSCOPY; OXIDATION;

EID: 0037124993     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00051-8     Document Type: Article

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4. An evaluation of candidate oxidation resistant materials for space applications