Influence of oxygen and argon on the crystal quality and piezoelectric response of AlN sputtered thin films

Diamond and Related Materials

Volumn 13, Issue 4-8, 2004, Pages 839-842

  Vergara, L ^a   Clement, M ^a   Iborra, E ^a   Sanz Hervas A ^a   Garcia Lopez J ^b   Morilla, Y ^b   Sangrador, J ^a   Respaldiza, M A ^b  

^a UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

^b CENTRO NACIONAL DE ACELERADORES   (Spain)

Author keywords

Aluminium nitride (AlN); Impurity characterization; Sputtering; Surface acoustic wave devices

Indexed keywords

ARGON; CRYSTAL LATTICES; GRAIN SIZE AND SHAPE; OXYGEN; PIEZOELECTRICITY; SILICON; THIN FILMS;

CRYSTAL QUALITY; ELECTROMECHANICAL COUPLING; SURFACE ACOUSTIC WAVES;

DIAMOND FILMS;

DIAMOND;

EID: 2442553906     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.10.063     Document Type: Article

References (12)

1. Naik R.S. Lutsky J.J. Reif R. Sodini C.G. Becker A. Fetter L.et al. IEEE Trans. Ferroelectrics Frequency Control 47 2000 292
2. F.S. Hickernell, Ultrasonics Symposium 2002, Proc. IEEE (2002) 231
3. Liaw H.M. Hickernell F.S. IEEE Trans. Ferroelectrics and Frequency Control 42 1995 404
4. Naik R.S. Reif R. Lutsky J.J. Sodini C.G. J. Electrochem. Soc. 146 1999 691
5. Dixit S.J. Raj A.K. Bhattacharya R.S. Guha S. Wittberg T. Thin Solid Films 398-399 2001 17
6. Garća López J. Morilla Y. Respaldiza M.A. Clement M. Iborra E. Sanz-Hervás A.et al. Diamond Relat. Mater. 12 2003 1157
7. Clement M. Iborra E. Sangrador J. Sanz-Hervás A. Vergara L. Aguilar M. J. Appl. Phys. 94 2003 1495
8. E. Iborra, M. Clement, J. Sangrador, A. Sanz-Hervás, L. Vergara, M. Aguilar, submitted to IEEE Trans. Ferroelectrics Frequency Control (2003)
9. de Keijser Th.H. Mittemeijer E.J. Rozendaal H.C.F. J. Appl. Cryst. 16 1983 309
10. Este G. Westwood W.D. J. Vac. Sci. Technol. A 5 1987 1892
11. Dubois M.-A. Muralt P. J. Appl. Phys. 89 2001 6389
12. Harris J.H. Youngman R.A. Teller R.G. J. Mater. Res. 5 1990 1763