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Volumn 7, Issue 7, 1988, Pages 755-764

Simulation of Microcrack Effects in Dissolution of Positive Resist Exposed by X-Ray Lithography

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY - PHOTOLITHOGRAPHY; PHOTORESISTS - ETCHING; SEMICONDUCTOR MATERIALS - CRACK PROPAGATION; X-RAYS;

EID: 0024048470     PISSN: 02780070     EISSN: 19374151     Source Type: Journal    
DOI: 10.1109/43.3946     Document Type: Article
Times cited : (11)

References (16)
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  • 2
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    • Dependence of dissolution rate on processing and molecular parameters of resists
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    • (1984) Polymers in Electronics
    • Ouano, A.C.1
  • 3
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    • Approaches to the design of radiation sensitive polymeric imaging systems with improved sensitivity and resolution
    • C.G. Willson, H. Ito, J.M.J. Frechet, T. Tessier, and F.M. Houlihan, “Approaches to the design of radiation sensitive polymeric imaging systems with improved sensitivity and resolution,” J. Electrochem. Soc., vol. 133, no. 1, p. 181, 1986.
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    • Willson, C.G.1    Ito, H.2    Frechet, J.M.J.3    Tessier, T.4    Houlihan, F.M.5
  • 4
    • 84939701081 scopus 로고
    • Reduction in X-ray lithography shot noise exposure limit by dissolution phenomena
    • presented at, Woodland Hills, CA, May 26–29
    • A.R. Neureuther and C.G. Willson, “Reduction in X-ray lithography shot noise exposure limit by dissolution phenomena,” presented at 30th Int. Symp. Electron, Ion and Photon Beams, Woodland Hills, CA, May 26–29, 1987.
    • (1987) 30th Int. Symp. Electron, Ion and Photon Beams
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  • 6
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    • Smythe, R.1    Wierman, J.2
  • 8
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    • First passage percolation, subadditive processes, stochastic networks, and generalized renewal theory
    • J. Neyman and LeCam, Eds. Berlin: Springer
    • H. Hammersley and D. Welsh, “First passage percolation, subadditive processes, stochastic networks, and generalized renewal theory,” in Bernoulli Bayes Laplace Anniversary Volume, J. Neyman and LeCam, Eds. Berlin: Springer, 1965.
    • (1965) Bernoulli Bayes Laplace Anniversary Volume
    • Hammersley, H.1    Welsh, D.2
  • 9
    • 84918433866 scopus 로고
    • On asymptotic behavior of percolation processes
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  • 10
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.