Fast simulation methods for defective EUV mask blank inspection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 2, 2004, Pages 741-750

  Lam, Michael C ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Buried defects; Defect inspection; Defective multilayers; EUV; EUV mask blanks; Extreme ultra violet lithography; Fast simulation methods

Indexed keywords

BURIED DEFECTS; DEFECT INSPECTION; DEFECTIVE MULTILAYERS; EUV MASK BLANKS; EXTREME ULTRA VIOLET LITHOGRAPHY (EUVL); FAST SIMULATION METHODS;

APPROXIMATION THEORY; COMPUTER SIMULATION; ELECTROMAGNETIC WAVES; FINITE DIFFERENCE METHOD; LITHOGRAPHY; MULTILAYERS; TIME DOMAIN ANALYSIS; ULTRAVIOLET RADIATION;

MASKS;

EID: 19844368399     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569075     Document Type: Conference Paper

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