Contact hole reticle optimization by using interference mapping lithography (IML™)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 222-240

  Socha, Bpbert ^a   Van Den Broeke, Douglas ^a   Hsu, Stephen ^a   Chen, J Fung ^a   Laidig, Tom ^a   Corcoran, Noel ^a   Hollerbach, Uwe ^a   Wampler, Kurt E ^a   Shi, Xuelong ^a   Conley, Will ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DELTA FUNCTION; DEPTH OF FOCUS (DOF); DESIGN FOR MANUFACTURE (DFM); INTERFERENCE MAPPING LITHOGRAPHY (IML);

BANDWIDTH; COHERENT LIGHT; COMPUTER SIMULATION; EIGENVALUES AND EIGENFUNCTIONS; IMAGING TECHNIQUES; LOGIC DEVICES; MAPPING; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY;

LITHOGRAPHY;

EID: 3843105673     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536581     Document Type: Conference Paper

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