Influence of partial coherence on projection printing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 174, Issue , 1979, Pages 22-27

  O'Toole M M ^a   Neureuther, A R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE - ETCHING; MASKS;

LITHOGRAPHY; ETCHING;

DEVELOPED RESIST PROFILES; ILLUMINATION COHERENCES; IMAGE INTENSITY DISTRIBUTION; PARTIAL COHERENCE; PARTIALLY COHERENT; REASONABLE VALUE; RESIST DEVELOPMENT; SIMULATION AND MODELING;

EID: 0018739406     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.957174     Document Type: Conference Paper

References (11)

1. J. D. Cuthbert, “Optical Projection Printing,” Solid State Technology, Aug. ’77, p. 59.
2. R. Hershel, “Partial Coherence in Projection Printing,” SPIE, vol. 135, Developments in Semiconductor Microlithography ITI, 1978.
3. Ron Herseel, “Effects of Partially Coherent Imagery in Resist Profiles,” Kodak Microelectronics Seminar, Interface ’78, Oct. 1-3, ’78, San Diego, Ca.
4. A.R. Neureuther, M. O’Toole, W. C. Oldham and S. Nandgaonkar, “User of Simulation to Optimize Projection Printing Profiles,” 153rd Meeting of the Electrochemical Society, Seattle, Wash., May 21-26, 1978.
5. W. G. Oldham, S. Nandgaonkar, A. R. Neureuther and M. O’Toole, “A General Simulator for VLSI Lithography and Etching Processes, Part 1 --Appl ication to Projection Lithography,” Trans. on Electron Devices, Apr. ’79.
6. R. E. Klnzly, “Investigations of the Influence of the Degree of Coherence upon Imar, es of Edge Objects,” JOSA, vol. 55, #8, Aug.
7. D. Nyyssonen, “Linewidtt Measurement with an Optical Microscope: the Effect of Operating Conditions on the Image Profile,” Appl. Opt., vol. 16, No. 8, Aug. ’77, p. 2223.
8. M. A. Narasimham and J. H. Carter, Jr., “Effects of Defocus on Photo-lithographic Images Obtained with Projection-Printing Systems,” SPIE Semiconductor Microlithography III, 1978.
9. F. H. Dill, A. R. Tleureuher, J. A. Tuttle and E. J. Walker, “Modelling Projection Printing of Positive Photoresists,” TBM Research, February 2, 1975, RC 5261.
10. F. H. Dill, W. P. Hornberger, P. S. Hauge and J. M. Shaw, “Characterization of Positive Photoresist,” IEEE Transactions on Electron Devices, vol. ED-22, no. 7, July ’75, p. 445.
11. R. Jewett, P. I. Hagoael, A. R. Peureuther and T. Van Duzer, “Line-Profile Resist Development Simulation Technicues,” Polymer Engineering and Science, vol. 14, no. 6, pp. 381-384, Juno 1977.