Large area phase-shift mask design

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2197, Issue , 1994, Pages 348-360

  Cobb, N ^a   Zakhor, A ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FAST FOURIER TRANSFORMS;

ALTERNATING PHASE SHIFT MASKS; ATTENUATED PHASE SHIFT MASKS; AUTOMATED DESIGN; EDGE SEGMENTS; FLOATING OBJECTS; IMAGE INTENSITIES; MASK FUNCTION; PHASE-SHIFT MASK;

IMAGE ENHANCEMENT;

EID: 85027259609     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.175429     Document Type: Conference Paper

References (10)

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3. B. Saleh "Image Synthesis: Discovery Instead of Recovery", Image Recovery - Theory and Application, Ch. 12, Editor: Henry Stark, Orlando: Academic Press, 1987.
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8. D. Newmark, J. Segen, S. Vaidya, A. Neureuther "Design, Verification, and Automation of Resolution Enhancement in Optical Lithography", Techcon 1993, Atlanta.
9. P.D. Flanner "Two-dimensional optical imaging for photolithography simulation", Electronics Research Laboratory Memorandum No. UCB/ERL M86/57, University of California at Berkeley, July 1986.
10. Fukuda H., Terasawa T., Okazaki S. "Spatial Filtering For Depth Of Focus And Resolution Enhancement In Optical Lithography", Journal Of Vacuum Science and Technology B-Microelectronics Processing And Phenomena, Vol. 9, No. 6, pp. 3113-3116 (1991).