Optical Imaging with Phase Shift Masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 470, Issue , 1984, Pages 228-232

  Prouty, Mark D ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS - MASKS;

ARBITRARY PHASE SHIFTS; IMAGING CHARACTERISTICS OF MASKS; OPTICAL LITHOGRAPHY IMAGE QUALITY;

LITHOGRAPHY;

EID: 0021621196     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.941921     Document Type: Conference Paper

References (4)

1. M.D. Levenson, N.S. Viswanathan, R.A. Simpson, "Improving Resolution in Photolithography with a Phase-Shifting Mask, " IEEE Trans. Elect. Dev., vol ED-29 No. 12, p.l828, 1982.
2. H.H. Hopkins, Proc. R. Soc. London Ser A, vol 217, p408, 1953.
3. S. Subramanian, "Rapid Calculation of Defocused Partially Coherent Images, " Appl. Opt., vol 20, p1854, 1981.
4. E.C. Kintner, "Method for the Calculation of Partially Coherent Imagery, " Appl. Opt., vol 17, p2747, 1978.