A pattern matching system for linking TCAD and EDA

Proceedings - 5th International Symposium on Quality Electronic Design, ISQUED 2004

Volumn , Issue , 2004, Pages 165-170

  Gennari, Frank E ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SOFTWARE; INTEGRATED CIRCUIT LAYOUT; MASKS; MICROPROCESSOR CHIPS; PHOTOLITHOGRAPHY; PROBLEM SOLVING; SHRINKAGE;

CHIP LAYOUT; EDA; MASK LAYOUT; TCAD;

PATTERN MATCHING;

EID: 2942687677     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISQED.2004.1283668     Document Type: Conference Paper

References (3)

1. A. Neureuther, F. Gennari, "No-Fault Assurance: Linking Fast Process CAD and EDA," SPIE Vol. 4889, 10/02.
2. Nick Cobb, "Fast Optical and Process Proximity Correction Algorithms for Integrated Circuit Manufacturing," PhD Thesis, University of California, Berkeley, 1998, pp. 38-45.
3. F. Gennari, G. Robins, and A. Neureuther, "Validation of the Aberration Pattern-Matching OPC Process," SPIE Vol. 4692B, 3/02.