Measuring optical image aberrations with pattern and probe based targets

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 1, 2002, Pages 338-343

  Robins, Garth ^a   Adam, Konstantinos ^a   Neureuther, Andrew ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; ELECTRIC FIELDS; FOURIER TRANSFORMS; IMAGING SYSTEMS; LENSES; LOW PASS FILTERS; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; PROBES;

OPTICAL IMAGE ABERRATIONS;

ABERRATIONS;

EID: 0036120917     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1447251     Document Type: Conference Paper

References (19)