Screening layouts for high-numerical aperture and polarization effects using pattern matching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2646-2652

  McIntyre, Gregory R ^a,b   Holwill, Juliet ^a   Neureuther, Andrew ^a   Capodieci, Luigi ^b   Zou, Yi ^b   Levinson, Harry ^b   Kye, Jongwook ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

REFERENCE POINT; THEORETICAL PATTERNS; VECTOR EFFECTS;

COMPUTER SIMULATION; IMAGE QUALITY; LINEAR SYSTEMS; POLARIZATION; SCREENING;

PATTERN MATCHING;

EID: 29044448752     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2132333     Document Type: Article

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