Proximity effects and influences of nonuniform illumination in projection lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 334, Issue , 1982, Pages 37-43

  Robertson, P D ^a   Wise, F W ^b   Nasr, A N ^b   Neureuther, A R ^b   Ting, C H ^c  

^a Data General Corporation   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATIONS; MASKING GUIDELINES; NON-UNIFORM CONDENSER APERTURE ILLUMINATION; NONUNIFORM SOURCE; OPTICAL LITHOGRAPHY; PROXIMITY EFFECTS;

LITHOGRAPHY;

EID: 0020270194     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.933558     Document Type: Conference Paper

References (8)

1. J.M. Shaw and M. Hatzakis, “Performance Characteristics of Diazo-Type Photoresists Under e-Beam and Optical Exposure, ” Trans, of IEEE an Electron Devices, Vol. ED-25, No. 4, pp. 425-430, April 1978.
2. W. G. Oldham, S. Nangaonkar, A. R. Neureuther, and M. M. O’Toole, “A General Simulator for VLSI Lithography and Etching Processes: Part I - Application to Projection Lithography, ” IEEE TYtms. on Electron Devices, Vol. ED-26, No. 4, pp. 717-722 April 1979.
3. P. D. Robertson, “Proximity Effects in Projection Lithography: A Case Study of the Perkin-Elmer’Micralign’, ” MS Thesis, University of California Berkeley, June 1981.
4. M. De and A. Basuray, “Two-point Resolution in Partially Coherent Light II. Ordinary Microscopy, Annular Source, ” Optica fata, Vol. 19, pp. 523, 1972.
5. T. S. McKechnie, “The Effect of Condenser Obstruction on the Two-point Resolution of a Microscope” Optica Acta, Vol. 19, pp. 729, 1972.
6. A. Basuray and P. Mukherjee, “Imaging with Sources of Non-uniform Distribution, ” Optica Acta, Vol 24 pp. Bl, 1977.
7. L. M. icmoxa and I. Suzuki, “Image of a Periodic Complex Object in an Optical System under Partially Coherent Illumination, ” J. Opt. Soc. Am, Vol. 66, No. 9, pp. 921, September 1976.
8. F.W. Wise, “Lens Aberrations and Nonuniform Illumination in Projection Lithography, ” M. S. Thesis, University of California, Berkeley, December 1981.