Tunable, high aspect ratio pillars on diverse substrates using copolymer micelle lithography: An interesting platform for applications

Nanotechnology

Volumn 19, Issue 28, 2008, Pages

  Krishnamoorthy, S ^a   Gerbig, Y ^a   Hibert, C ^b   Pugin, R ^a   Hinderling, C ^a   Brugger, J ^b   Heinzelmann, H ^a  

^a CSEM   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COLLOIDS; COPOLYMERIZATION; CUBIC BORON NITRIDE; DIMENSIONAL STABILITY; HYDROPHOBICITY; LITHOGRAPHY; METALLIZING; MICELLES; NITRIDES; NONMETALS; OXIDE FILMS; OXIDE MINERALS; PHOTORESISTS; PLASTIC PRODUCTS; POLYMERIC MEMBRANES; POLYMERS; QUARTZ; QUARTZ APPLICATIONS; SILICON; SILICON COMPOUNDS; SILICON NITRIDE; SURFACE CHEMISTRY; THICK FILMS; THIN FILMS; TITANIUM; TITANIUM COMPOUNDS; TITANIUM NITRIDE;

(100) SILICON; (2+1) DIMENSIONS; (ETHYLENE VINYL ALCOHOL) COPOLYMERS; 2-VINYLPYRIDINE (P2VPY); AREAL DENSITY (AD); DIFFERENT SUBSTRATES; HIGH ASPECT RATIO (HAR); NANO POROUS; NANO-PILLARS; NITRIDE NANOSTRUCTURES; REVERSE MICELLES; SILICON OXIDES; SUPER HYDROPHOBIC SURFACES;

VAPOR DEPOSITION;

COPOLYMER; SILICON; SILICON DIOXIDE; SILICON NITRIDE; TITANIUM;

ARTICLE; FILM; PHASE SEPARATION; PRIORITY JOURNAL; TRANSMISSION ELECTRON MICROSCOPY; VAPOR; WETTABILITY;

EID: 44949217426     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/28/285301     Document Type: Article

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