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Macromolecular Symposia

Volumn 196, Issue , 2003, Pages 45-56

Poly(ferrocenylsilanes) as etch barriers in nano and microlithographic applications

(4) Hempenius, Mark A a Lammertink, Rob G H a Péter, Mária a Vancso, G Julius a

a UNIVERSITY OF TWENTE (Netherlands)

Author keywords

Block copolymers; Nanolithography; Organometallic polymers; Polyelectrolytes; Reactive ion etching

Indexed keywords

ADSORPTION; BLOCK COPOLYMERS; ELECTROSTATICS; IRON COMPOUNDS; MULTILAYERS; NANOTECHNOLOGY; NEGATIVE IONS; PHASE SEPARATION; POLYISOPRENES; POLYSTYRENES; POSITIVE IONS; REACTIVE ION ETCHING; SELF ASSEMBLY; SEMICONDUCTING FILMS;

POLYCATIONS;

METALLORGANIC POLYMERS;

COPOLYMER; ISOPRENE; ORGANOMETALLIC COMPOUND; POLYANION; POLYCATION; POLYFERROCENYLSILANE; POLYSTYRENE; SILANE DERIVATIVE; SILICON; UNCLASSIFIED DRUG;

ADSORPTION; ARTICLE; CHEMICAL COMPOSITION; CHEMICAL STRUCTURE; ELECTRICITY; FILM; NANOPARTICLE; PARTICLE SIZE; REACTION ANALYSIS; STRUCTURE ANALYSIS;

EID: 0042847397 PISSN: 10221360 EISSN: None Source Type: Journal
DOI: 10.1002/masy.200390175 Document Type: Article

Times cited : (16)

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