Ordered arrays of silicon pillars with controlled height and aspect ratio

Nanotechnology

Volumn 18, Issue 30, 2007, Pages

  Sinitskii, Alexander ^a,b   Neumeier, Stefan ^b   Nelles, Jürgen ^b   Fischler, Monika ^b   Simon, Ulrich ^b  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MASKS; NANOSPHERES; REACTIVE ION ETCHING; SILICON;

CHROMIUM NANOISLANDS; NANOISLANDS; SILICON PILLARS;

NANOTECHNOLOGY;

CHROMIUM; SILICON; SILICON DIOXIDE;

ARTICLE; HEIGHT; PRIORITY JOURNAL;

EID: 34547174803     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/30/305307     Document Type: Article

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