Investigation of static corrosion between W Metals and TiNx Barriers in a W chemical-mechanical-polishing slurry

Journal of the Electrochemical Society

Volumn 155, Issue 7, 2008, Pages

  Hung, Chi Cheng ^a   Wang, Ying Lang ^b,c   Lee, Wen Hsi ^a,d   Chang, Shih Chieh ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL CHIAYI UNIVERSITY   (Taiwan)

^c NATIONAL UNIVERSITY OF TAINAN   (Taiwan)

^d ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL MECHANICAL POLISHING; CORROSIVE EFFECTS; DEPOSITION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; EQUIVALENT CIRCUITS; SCANNING ELECTRON MICROSCOPY; TITANIUM NITRIDE; TUNGSTEN;

GALVANIC CORROSION; TANTALUM OXIDE; X RAY DIFFRACTROMETRY;

THIN FILMS;

EID: 44349087772     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2907394     Document Type: Article

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