MOCVD of TiN and/or Ti from new precursors

Thin Solid Films

Volumn 320, Issue 1, 1998, Pages 15-19

  Lee, Jaegab ^a   Kim, Jiyong ^a   Shin, Hyunkook ^b  

^a Kookmin University   (South Korea)

^b Ultra Pure Chemical Inc   (South Korea)

Author keywords

(acac)2TiNEt2; MOCVD Ti TiN; New precursor; TEMAT

Indexed keywords

AMMONIA; AUGER ELECTRON SPECTROSCOPY; COLOR; DISSOCIATION; FILM GROWTH; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA APPLICATIONS; PYROLYSIS; TITANIUM NITRIDE;

QUADRUPOLE MASS SPECTROMETER; TETRAKIS ETHYLMETHYL AMIDO TITANIUM;

THIN FILMS;

EID: 0032482045     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01059-6     Document Type: Article

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