TEM studies of the microstructure evolution in plasma treated CVD TiN thin films used as diffusion barriers

Solid-State Electronics

Volumn 43, Issue 6, 1999, Pages 1063-1068

  Ikeda, S ^a   Palleau, J ^b   Torres, J ^b   Chenevier, B ^a   Bourhila, N ^a   Madar, R ^a  

^a Grenoble INP Phelma   (France)

^b ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NANOSTRUCTURED MATERIALS; SYNTHESIS (CHEMICAL); TEXTURES; THIN FILMS; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

PLASMA TREATMENT;

SEMICONDUCTING FILMS;

EID: 0032658021     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(99)00025-8     Document Type: Article

References (5)

1. Eizenberg M., Littau K., Ghanayem S., Mak A., Yamada Y., Chang M., Shinha A.K. Appl Phys Lett. 65:1994;2416.
2. Marcadal C, Richard E, Torres J, Palleau J, Ulmer L, Perroud L. Materials for advanced metallization (MAM '97), European Workshop/Villard de Lans, 16-3-1997. p. 54.
3. Eizenberg M., Littau K., Ghanayem S., Liao M., Mosely R., Shinha A.K. J Vac Sci Technol A. 13:1995;590.
4. Yu L., Harper J.M.E., Cuomo J.J., Smith D.A. Appl Phys Lett. 47:1985;932.
5. Yu L., Harper J.M.E., Cuomo J.J., Smith D.A. J Vac Sci Technol A. 4:1986;443.