'Volcano' reactions in oxide vias between tungsten CVD and bias sputtered TiN/Ti films

Journal of the Electrochemical Society

Volumn 147, Issue 5, 2000, Pages 1982-1987

  Herner, S B ^a   Tanaka, Y ^a   Zhang, H ^a   Ghanayem, S G ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; OXIDES; RAPID THERMAL ANNEALING; SILICON WAFERS; SPUTTER DEPOSITION; TITANIUM COMPOUNDS; TUNGSTEN;

IONIZED METAL PLASMA; SILICON INTEGRATED CIRCUITS; VOLCANO REACTIONS;

CHEMICAL REACTIONS;

EID: 0033748005     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393471     Document Type: Article

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