Thermal stability of Hf-based high-k dielectric films on silicon for advanced CMOS devices

Materials Science and Engineering: B

Volumn 112, Issue 2-3 SPEC. ISS., 2004, Pages 134-138

  Bastos, K P ^a   Driemeier, C ^a   Pezzi, R P ^a   Soares, G V ^a   Miotti, L ^a   Morais, J ^a   Baumvol, I J R ^b   Wallace, R M ^c  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b UNIVERSITY OF CAXIAS DO SUL   (Brazil)

^c The University of Texas at Dallas   (United States)

Author keywords

High k; Oxygen diffusion; Thermal stability; XPS

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIFFUSION; OXIDATION; OZONE; RAPID THERMAL ANNEALING; RESONANCE; SILICON; SPUTTERING; SUBSTRATES; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC TRANSPORT; NUCLEAR RESONANCE PROFILING (NRP); OXYGEN DIFFUSION; PRE-ANNEALING;

DIELECTRIC FILMS;

EID: 4344648486     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.05.020     Document Type: Article

References (16)

1. A. Kingon, J.-P. Maria, S.K. Streiffer, Nature 406 (2000) 1032.
2. G.D. Wilk, R.M. Wallace, J.M. Anthony, J. App. Phys. 89 (2001) 5243.
3. L. Manchada, M.D. Morris, M.L. Green, R.B. van Dover, F. Klemens, T.W. Sorsch, P.J. Silverman, G. Wilk, B. Busch, S. Aravamudhan, Microelectron. Eng. 59 (2001) 351.
4. M.R. Visokay, J.J. Chambers, A.L.P. Rotondaro, A. Shanware, L. Colombo, Appl. Phys. Lett. 80 (2002) 3183.
5. M.S. Akbar, S. Gopalan, H.-J. Cho, K. Onishi, R. Choi, R. Nieh, C.S. Kang, Y.H. Kim, J. Han, S. Krishnan, J.C. Lee, Appl. Phys. Lett. 82 (2003) 1757.
6. M. Quevedo-Lopez, M. El-Bouanani, M.J. Kim, B.E. Gnade, R.M. Wallace, M.R. Visokay, A. LiFatou, J.J. Chambers, L. Colombo, Appl. Phys. Lett. 82 (2003) 4669.
7. P. Punchaipetch, G.Pant,M.Quevedo-Lopez, H.Zhang,M. El-Bouanani, M.J. Kim, R.M. Wallace, B.E. Gnade, Thin Solid Films 425 (2003) 68.
8. U.R. Baumvol, Surf. Sci. Rep. 36 (1999) 1.
9. R.M.C. de Almeida, I.J.R. Baumvol, Surf. Sci. Rep. 49 (2003) 1.
10. K.P. Bastos, J. Morals, L. Miotti, R.P. Pezzi, G.V. Snares, I.J.R. Baumvol, R.I. Hegde, H.H. Tseng, P.J. Tobin, Appl. Phys. Lett. 81 (2002) 1669.
11. J. Morais, L. Miotti, G.V. Soares, S.R. Teixeira, R. Pezzi, K.P. Bastos, I.J.R. Baumvol, A.L.P. Rotondaro, J.J. Chambers, M.R. Visokay, L. Colombo, Appl. Phys. Lett. 81 (2002) 2995.
12. NIST X-ray Photoelectron Spectroscopy Database (2000). Available on http://www.srdata.nist.gov/xps/index.htm
13. J.J. Chambers, G.N. Parsons, Appl. Phys. Lett. 77 (2000) 2385.
14. J.P. Chang, M.L. Green, V.M. Donnely, R.L, Opila, J. Eng Jr., J. Sapjeta, P.J. Silverman, B. Weir, H.C. Lu, T. Gustafsson, E. Garfunkel, J. Appl. Phys. 87 (2000) 4449.
15. M. Takahashi, T. Mizokuro, Y. Nishioka, H. Kobayashi, Surf. Sci. 518 (2002) 72.
16. A.N. Itakura, M. Shimoda, M. Kitajima, Appl. Surf. Sci. 216 (2002) 41.