Micronanoscopic patterning of polymeric materials by atomic force microscope assisted electrohydrodynamic nanolithography

Journal of Applied Physics

Volumn 103, Issue 2, 2008, Pages

  Xie, Xian Ning ^a   Chung, Hong Jing ^c   Bandyopadhyay, Dipankar ^b   Sharma, Ashutosh ^b   Sow, Chorng Haur ^c   Wee, Andrew Thye Shen ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BIAS VOLTAGE; ELECTROHYDRODYNAMICS; NANOLITHOGRAPHY; NANOSTRUCTURED MATERIALS;

ELECTROHYDRODYNAMIC NANOLITHOGRAPHY; MICRONANOSCOPIC PATTERNING;

POLYMER FILMS;

LITHOGRAPHY; POLYMERS;

EID: 38849085181     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2832761     Document Type: Article

References (37)

1. E. Schaffer, T. Thurn-Albrecht, T. P. Russell, and U. Steiner, Nature (London) NATUAS 0028-0836 10.1038/35002540 403, 874 (2000).
2. S. F. Lyuksyutov, R. A. Vaia, P. B. Paramonov, S. Juhl, L. Waterhouse, R. M. Ralich, G. Sigalov, and E. Sancaktar, Nat. Mater. NMAACR 1476-1122 10.1038/nmat926 2, 468 (2003).
3. S. F. Lyuksyutov, P. B. Paramonov, R. A. Sharipov, and G. Sigalov, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.70.174110 70, 174110 (2004).
4. J. G. Goodberlet, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.125856 76, 667 (2000).
5. J. Fujita, Y. Ohnishi, Y. Ochiai, and S. Matsui, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.115958 68, 1297 (1996).
6. O. F. Gobel, M. Nedelcu, and U. Steiner, Adv. Funct. Mater. AFMDC6 1616-301X 10.1002/adfm.200600783 17, 1131 (2007).
7. E. Schaffer, S. Harkema, M. Roerdink, R. Blossey, and U. Steiner, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.200390119 15, 514 (2003).
8. R. Verma, A. Sharma, K. Kargupta, and J. Bhaumik, Langmuir LANGD5 0743-7463 21, 3710 (2005).
9. A. Sharma, Eur. Phys. J. E EPJSFH 1292-8941 10.1140/epje/e2004-00008-5 12, 397 (2003).
10. P. Deshpande, X. Sun, and S. Y. Chou, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1398616 79, 1688 (2001).
11. L. Wu and S. Y. Chou, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1572963 82, 3200 (2003).
12. N. Wu, L. F. Pease III, and W. B. Russel, Langmuir LANGD5 0743-7463 10.1021/la052099z 21, 12290 (2005).
13. N. E. Voicu, S. Harkema, and U. Steiner, Adv. Funct. Mater. AFMDC6 1616-301X 10.1002/adfm.200500470 16, 926 (2006).
14. X. N. Xie, H. J. Chung, C. H. Sow, and A. T. S. Wee, Mater. Sci. Eng., R. MIGIEA 0927-796X 10.1016/j.mser.2006.10.001 54, 1 (2006).
15. B. Cappella and H. Sturm, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1421632 91, 506 (2002).
16. R. D. Piner, J. Zhu, F. Xu, S. Hong, and C. A. Mirkin, Science SCIEAS 0036-8075 10.1126/science.283.5402.661 283, 661 (1999).
17. K. Salaita, Y. H. Wang, and C. A. Mirkin, Nat. Nanotechnol. NNAABX 1748-3387 10.1038/nnano.2007.39 2, 145 (2007).
18. D. S. Ginger, H. Zhang, and C. A. Mirkin, Angew. Chem., Int. Ed. ACIEF5 1433-7851 10.1002/anie.200300608 43, 30 (2004).
19. P. Vettiger, IEEE Trans. Nanotechnol. ZZZZZZ 1536-125X 1, 39 (2002).
20. W. P. King, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1351846 78, 1300 (2001).
21. M. A. Lantz, B. Gotsmann, U. T. Durig, P. Vettiger, Y. Nakayama, T. Shimizu, and H. Tokumoto, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1600835 83, 1266 (2003).
22. M. Tello, R. Garcia, J. A. Martin-Gago, N. F. Martinez, M. S. Martin-Gonzalez, L. Aballe, A. Baranov, and L. Gregoratti, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.200401466 17, 1480 (2005).
23. R. V. Martinez and R. Garcia R, Nano Lett. NALEFD 1530-6984 10.1021/nl0505243 5, 1161 (2005).
24. R. Garcia and M. Tello, Nano Lett. NALEFD 1530-6984 10.1021/nl049544f 4, 1115 (2004).
25. X. N. Xie, H. J. Chung, C. H. Sow, K. Adamiak, and A. T. S. Wee, J. Am. Chem. Soc. JACSAT 0002-7863 10.1021/ja054225r 127, 15562 (2005).
26. X. N. Xie, J. Am. Chem. Soc. JACSAT 0002-7863 10.1021/ja0577241 128, 2738 (2006).
27. X. N. Xie, H. J. Chung, C. H. Sow, A. A. Bettiol, and A. T. S. Wee, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.200500204 17, 1386 (2005).
28. H. J. Chung, X. N. Xie, C. H. Sow, A. A. Bettiol, and A. T. S. Wee, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2162800 88, 023116 (2006).
29. X. N. Xie, H. J. Chung, C. H. Sow, and A. T. S. Wee, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1728305 84, 4914 (2004).
30. X. N. Xie, H. J. Chung, H. Xu, X. Xu, C. H. Sow, and A. T. S. Wee, J. Am. Chem. Soc. JACSAT 0002-7863 10.1021/ja049560e 126, 7665 (2004).
31. X. N. Xie, H. J. Chung, C. H. Sow, and A. T. S. Wee, Adv. Funct. Mater. AFMDC6 1616-301X 10.1002/adfm.200600439 17, 919 (2007).
32. A. Ghatak, R. Khanna, and A. Sharma, J. Colloid Interface Sci. JCISA5 0021-9797 10.1006/jcis.1998.6052 212, 483 (1999).
33. R. Khanna and A. Sharma, J. Colloid Interface Sci. JCISA5 0021-9797 10.1006/jcis.1997.5134 195, 42 (1997).
34. Z. Lin, T. Kerle, T. P. Russell, E. Schaffer, and U. Steiner, Macromolecules MAMOBX 0024-9297 10.1021/ma020311p 35, 6255 (2002).
35. D. J. Plazek, J. Polym. Sci., Polym. Phys. Ed. JPLPAY 0098-1273 10.1002/pol.1982.180200414 20, 729 (1982).
36. Z. Lin, T. Kerle, T. P. Russell, E. Schaffer, and U. Steiner, Macromolecules MAMOBX 0024-9297 10.1021/ma0122425 35, 3971 (2002).
37. E. Schaffer, T. Thurn-Albrecht, T. P. Russell, and U. Steiner, Europhys. Lett. EULEEJ 0295-5075 53, 518 (2001).