The Mechanical properties of alumina films formed by plasma deposition and by ion irradiation of sapphire

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 166, Issue , 2000, Pages 140-147

  Barbour, J C ^a   Knapp, J A ^a   Follstaedt, D M ^a   Mayer, T M ^a   Minor, K G ^a   Linam, D L ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHIZATION; DEPOSITION; ELECTRON BEAMS; EVAPORATION; ION BEAMS; ION BOMBARDMENT; OXYGEN; PLASMA APPLICATIONS; RADIATION DAMAGE; SAPPHIRE; YIELD STRESS;

ELECTRON BEAM EVAPORATION; PLASMA DEPOSITION;

ALUMINA;

EID: 0033729282     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00648-5     Document Type: Article

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