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Thin Solid Films

Volumn 388, Issue 1-2, 2001, Pages 50-61

Chemical vapour deposition of κ-Al2O3

(2) Ruppi, S a Larsson, A b

a SECO TOOLS AB (Sweden)

b CHALMERS UNIVERSITY OF TECHNOLOGY (Sweden)

Author keywords

Al2 O3; Al2O3; Al2O3; Catalysis; Cemented carbide cutting tools; Chemical vapour deposition

Indexed keywords

ALUMINA; CARBIDE CUTTING TOOLS; CATALYSIS; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); FILM GROWTH; MICROSTRUCTURE; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CEMENTED CARBIDE CUTTING TOOLS;

PROTECTIVE COATINGS;

EID: 0035372138 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)00814-8 Document Type: Article

Times cited : (66)

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