Highly oriented α-alumina films grown by pulsed laser deposition

Thin Solid Films

Volumn 305, Issue 1-2, 1997, Pages 243-247

  Hirschauer, B ^a   Soderholm S ^b   Chiaia, G ^a   Karlsson, U O ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b ABB CORPORATE RESEARCH   (Sweden)

Author keywords

Laser ablation; Pulsed laser deposition; Temperature dependence; X ray diffraction; XPS; Al2O3 film

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; FILM GROWTH; LASER ABLATION; PULSED LASER APPLICATIONS; THERMAL EFFECTS; X RAY CRYSTALLOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

FULL WIDTH AT HALF MAXIMUM (FWHM); PULSED LASER DEPOSITION; ROCKING CURVE MEASUREMENTS;

ALUMINA;

EID: 0031208334     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00151-X     Document Type: Article

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