Correlation between the method of preparation and the properties of the sol-gel HfO2 thin films

Journal of Non-Crystalline Solids

Volumn 354, Issue 2-9, 2008, Pages 409-415

  Zaharescu, M ^a   Teodorescu, V S ^b   Gartner, M ^a   Blanchin, M G ^c   Barau, A ^a   Anastasescu, M ^a  

^a INSTITUTE OF PHYSICAL CHEMISTRY   (Romania)

^b NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^c UNIVERSITÉ LYON 1   (France)

Author keywords

Ellipsometry; HRTEM TEM; Microcrystallinity; Porosity; Sol gels (xerogels); Thin film transistors

Indexed keywords

ELLIPSOMETRY; HAFNIUM COMPOUNDS; HEAT TREATMENT; OPTICAL PROPERTIES; POROSITY; SILICON WAFERS; SOL-GELS; THIN FILM TRANSISTORS; TRANSMISSION ELECTRON MICROSCOPY;

COATING-SUBSTRATE INTERFACE; HAFNIUM CHLORIDE; HAFNIUM ETHOXIDE; VISIBLE RANGE;

THIN FILMS;

EID: 36849057556     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.07.097     Document Type: Article

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