Ultraviolet irradiation hardening of hafnia films prepared by sol-gel processes

Journal of the Ceramic Society of Japan

Volumn 113, Issue 1313, 2005, Pages 77-81

  Nishide, Toshikazu ^a   Meguro, Tomomi ^a   Suzuki, Sawako ^a   Yabe, Takayuki ^a  

^a NIHON UNIVERSITY   (Japan)

Author keywords

Formic acid; Hafnia; Hardening; Sol gel process; Temperature programmed desorption; UV irradiation

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HAFNIUM COMPOUNDS; MERCURY VAPOR LAMPS; SOL-GELS; TEMPERATURE PROGRAMMED DESORPTION; ULTRAVIOLET RADIATION;

FORMIC ACID; HAFNIA; SOL-GEL PROCESS; UV IRRADIATION;

THIN FILMS;

EID: 13844281339     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.113.77     Document Type: Article

References (38)

1. Brinker, C. J. and Scherer, G. W., "Sol-Gel Science," Academic Press, San Diego (1990).
2. "Sol-Gel Processing of Advanced Materials," Ed. by Klein, L. C., Sakka, S. and Woolfrey, J. L., Am. Ceram. Soc., Westerville, Ohio (1998).
3. Wright, J. D. and Sommerdijk, N. A. J. M., "Sol-Gel Materials," Gordon and Breach Science, Amsterdam (2001).
4. Campostrimi, R., J. Therm. Anal. Calorim., Vol. 71, pp. 997-1009 (2003).
5. Zhang, Y., Yang, Y., Tian, S., Liao, C. and Yan, C., J. Mater. Chem., Vol. 12, pp. 219-224 (2002).
6. Gallo, T. A., Simms, B. L. and Brice, V. T., Mat. Res. Soc. Symp. Proc., Vol. 180, pp. 269-272 (1990).
7. Ghosh, N. N. and Parmanik, P., Mater. Sci. Eng. C, Vol. 16, pp. 113-117 (2001) and references therein.
8. Ghosh, N. N., Saha, S. K. and Pramanik, P., Br. Ceram. Trans., Vol. 97, pp. 180-184 (1998).
9. Nilsen, E., Puputti, J., Linden, M., Bell, J. L., Perander, M. and Einarsrud, M., J. Sol-Gel Sci. Technol., Vol. 26, pp. 1239-1242 (2003).
10. de Azevedo, W. M. and Brondami, D. J., J. Non-Cryst. Solids, Vol. 296, pp. 224-229 (2001).
11. Panitz, J.-C. and Wokaun, A., J. Sol-Gel Sci. Technol., Vol. 9,pp. 251-263 (1997).
12. Ohishi, T., Maekawa, S. and Katoh, A., J. Non-Cryst. Solids, Vol. 147-148, pp. 493-498 (1992).
13. Imai, H., Hirashima, H. and Awazu, K., Thin Solid Films, Vol. 351, pp. 91-94 (1999).
14. Imai, H., Tominaga, A, Hirashima, H., Toki, M. and Asakuma, N., J. Appl. Phys., Vol. 85, pp. 203-207 (1999).
15. Hirai, S., Shimakage, K., Sekiguchi, M., Wada, K. and Nukui, A., J. Am. Ceram. Soc., Vol. 82, pp. 2011-2016 (1999).
16. Yu, J. J. and Boyd, I. W., Appl. Phys. A, Vol. 74, pp. 143-146 (2002).
17. Takahashi, T. and Nishide, T., J. Ceram, Soc. Japan, Supple., Vol. 112, pp. S234-S238 (2004).
18. Nishide, T., Honda, S., Matsuura, M. and Ide, M., Thin Solid Films, Vol. 371, pp. 61-65 (2000).
19. Nishide, T., Honda, S., Matsuura, M., Ito, Y. and Takase, T., Jpn. J. Appl. Phys., Vol. 39, pp. L237-L240 (2000).
20. Kawamoto, M., Ishizaki, K. and Ishizaki, C., "Temperature Programmed Desorption as a Surface Characterization Method of Ceramic Powders," in Handbook of Characterization Techniques for the Solid-Solution Interface, Ed. by Adir, J. H., Casey, J. A. and Venigalla, S., Am. Ceram. Soc., Westerville (1993) pp. 283-292.
21. Kawamoto, M., Ishizaki, C. and Ishizaki, K., J. Mater. Sci. Letters, Vol. 10, pp. 279-281 (1991).
22. Hirashita, N., Tokitoh, S. and Uchida, H., Jpn. J. Appl. Phys., Vol. 32, pp. 1787-1793 (1993).
23. Murase, K., Yabumoto, N. and Komine, Y., J. Electrochem. Soc., Vol. 140, pp. 1722-1727 (1993).
24. Niwano, M., Kinashi, K., Saito, K., Miyamoto, N. and Honma, K., J. Electrochem. Soc., Vol. 141, pp. 1556-1561 (1994).
25. Usami, K., Sugahara, S., Kobayashi, M., Sumimura, K., Hattori, T. and Matsumura, M., J. Non-Cryst. Solids, Vol. 260, pp. 199-207 (1999).
26. Kumar, A., Bakhru, H., Fortin, J. B., Yang, G.-R., Lu, T.-M., Jin, C. and Lee, W. W., Thin Solid Films, Vol. 396, pp. 5-8 (2001).
27. Nakajima, T., Matsuoka, M., Mishima, S. and Matsuzaki, I., Nippon Kagaku Kaishi, pp. 972-976 (1994).
28. Nakajima, T., Kuribayashi, H. and Mishima, S., Denki Kagaku, Vol. 65, pp. 871-875 (1997).
29. Tsugoshi, T., Furukawa, M., Ohashi, M. and Iida, Y., Anal. Sci., Vol. 15, pp. 327-331 (1999).
30. Gun'ko, V. M., Zarko, V. I., Chuikov, B. A., Dudnik, V. V., Ptushinskii, Y. G., Voronin, E. F., Pakhlov, E. M. and Chuiko, A. A., Int. J. Mass Spctrom. Ion Processes, Vol. 172, pp. 161-179 (1998).
31. Nishide, T. and Yabe, T., Thin Solid Films, Vol. 467, pp. 43-49 (2004).
32. Tauc, R. G. and Vancu, A., Phys. Status Solidi, Vol. 15, pp. 627-637 (1966).
33. Mott, N. F. and Davis, E. A., "Electronic Processes in Non-Crystalline Materials," Claredndon Press, Oxford (1971).
34. Compagnini, G., Foti, G., Reitano, R. and Mondio, G., J. Non-Cryst. Solids, Vol. 162, pp. 237-243 (1993).
35. Chrysicopoulou, P., Davazoglou, D., Trapalis, C. and Kordas, G., Thin Solid Films, Vol. 323, pp. 188-193 (1998).
36. Nakamoto, K., "Infrared and Raman Spectra of Inorganic and Coordination Compounds Part B," Fifth ed., John Wiley & Sons, New York (1997) pp. 59-62.
37. Redhead, P. A., Vacuum, Vol. 12, pp. 203-211 (1962).
38. Hirashita, H. and Uchiyama, T., Bunseki Kagaku, Vol. 43, pp 757-764 (1994).