Lithographic performance and optimization of chemically amplified single layer resists for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 600-607

  Watanabe, Takeo ^a   Kinoshita, Hiroo ^a   Miyafuji, Atsushi ^a   Irie, Shigeo ^a   Shirayone, Shigeru ^a   Mori, Shigeyasu ^a   Yano, Ei ^a   Hada, Hideo ^a   Ohmori, Katsumi ^a   Komano, Hiroshi ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPHERICS; IMAGING SYSTEMS; MIRRORS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTORESISTS;

EID: 0033700382     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)