Novel evaluation system for extreme ultraviolet lithography resist in NewSUBARU

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5556-5559

  Watanabe, Takeo ^a,c   Kinoshita, Hiroo ^a,c   Sakaya, Noriyuki ^b,c   Shoki, Tsutomu ^b,c   Lee, Seung Yoon ^a,c  

^a UNIVERSITY OF HYOGO   (Japan)

^b HOYA CORPORATION   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Chemically amplified resist; Exposure characteristics; Extreme ultraviolet lithography; Outgassing

Indexed keywords

DEGASSING; MASS SPECTROMETERS; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESIST; EXOPSURE CHARACTERISTICS; EXTREME ULTRAVIOLET LITHOGRAPHY;

LITHOGRAPHY;

EID: 31844454835     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5556     Document Type: Article

References (14)

1. H. Kinoshita, K. Kurihara, Y. Ishii and Y. Torii: J. Vac. Sci. & Technol. B 7 (1989) 1648.
2. H. Ito, G. Breyta, D. Hofer, R. Sooriyakumaran, K. Petrillo and D. Seeger: J. Photopolym. Sci. Technol. 7 (1994) 433.
3. M. A. MaCord and M. J. Rooks: Microlithography, Micromachining and Microfabrication, Vol. 1; Microlithography, ed. P. Rai-Choudhury, p. 208.
4. T. Watanabe, H. Kinoshita, A. Miyafuji, S. Irie, S. Shirayone, S. Mori, E. Yano, S. Okazaki, H. Hada, K. Ohmori and H. Koraano: SPIE 3997 (2000) 600.
5. T. Watanabe, H. Kinoshita, H. Nii, Y. Li, K. Hamamato, T. Oshino, K. Sugisaki, K. Murakami, S. Irie, S. Shirayone, Y. Oomei and S. Okazaki: J. Vac. Sci. & Technol. B 18 (2000) 2905.
6. T. Watanabe, H. Kinoshita, H. Nii, K. Hamamoto, H. Hada, H. Komano and S. Irie: J. Vac. Sci. & Technol. B 19 (2001) 736.
7. K. Hamamoto, T. Watanabe, H. Tsubakino, H. Kinoshita, T. Shoki and M. Hosoya: J. Photopolym. Sci. Technol. 14 (2001) 567.
8. T. Watanabe, K. Hamamoto, H. Kinoshita, H. Tsubakino, H. Hada. H. Komano, M. Endo and M. Sasago: J. Photopolym. Sci. Technol. 14 (2001) 555.
9. K. Hamamoto, T. Watanabe, H. Hada, H. Komano and H. Kinoshita: J. Photopolym. Sci. Technol. 15 (2002) 361.
10. T. Watanabe, K. Hamamoto, H. Kinoshita, H. Hideo and H. Komano: J. Appl. Phys. 43 (2004) 3713.
11. T. Watanabe, T. Haga, M. Niibe and H. Kinoshita: J. Synchrotron Rad. 5 (1998) 1149.
12. S. Hashimoto et al.: Trans. Mater. Res. Soc. Jpn. 26 (2001) 783.
13. R. H. Day, P. Lee, E. B. Saloman and D. J. Nagel: J. Appl. Phys. 52 (1981) 6965.
14. N. N. Matsuzawa, S. Irie, E. Yano, S. Okazaki and A. Ishitani: Proc. SPIE 4343 (2001) 151.