Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 3, 2001, Pages 736-742

  Watanabe, Takeo ^a   Kinoshita, Hiroo ^a   Nii, Hajime ^a   Hamamoto, Kazuhiro ^a   Tsubakino, Harushige ^a   Hada, Hideo ^b   Komano, Hiroshi ^b   Irie, Shigeo ^c  

^a UNIVERSITY OF HYOGO   (Japan)

^b TOKYO OHKA KOGYO CO LTD   (Japan)

^c ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEGASSING; ELECTRON BEAM LITHOGRAPHY; MASKS; MASS SPECTROMETRY; REFLECTION;

EXTREME ULTRAVIOLET LITHOGRAPHY;

PHOTORESISTS;

EID: 0035326267     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1368671     Document Type: Conference Paper

References (10)

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