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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4105-4110

Fine pattern replication using ETS-1 three-aspherical mirror imaging system

(8) Watanabe, Takeo a Kinoshita, Hiroo d Hamamoto, Kazuhiro d Hosoya, Morio b Shoki, Tsutomu c Hada, Hideo b Komano, Hiroshi a,e Okazaki, Shinji a

a UNIVERSITY OF HYOGO (Japan)

b Faculty of Engineering (Japan)

c HOYA CORPORATION (Japan)

d TOKYO OHKA KOGYO CO LTD (Japan)

e ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET (Japan)

Author keywords

DRAM; EUVL; Lithography; Mask; Resist; Synchrotron radiation

Indexed keywords

ASPHERICS; CHROMIUM; DYNAMIC RANDOM ACCESS STORAGE; LIGHT REFLECTION; MASKS; MIRRORS; MULTILAYERS; PHOTORESISTS; SYNCHROTRONS; ULTRAVIOLET RADIATION;

MIRROR IMAGING SYSTEMS;

IMAGING SYSTEMS;

EID: 0036614618 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.4105 Document Type: Article

Times cited : (21)

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