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Volumn 28, Issue 20, 2007, Pages 1995-2000

A simple imprint method for multi-tiered polymer nanopatterning on large flexible substrates employing a flexible mold and hemispherical PDMS elastomer

Author keywords

Flexible mold; Hemispherical PDMS elastomer; Imprint lithography; Multi tiered nanopatterning; Photolithography; Photoresists

Indexed keywords

ADHESION; ELASTOMERS; PHOTORESISTS; PLASTIC MOLDS; POLYDIMETHYLSILOXANE; SUBSTRATES;

EID: 35549010196     PISSN: 10221336     EISSN: 15213927     Source Type: Journal    
DOI: 10.1002/marc.200700362     Document Type: Article
Times cited : (9)

References (31)
  • 5
    • 33744491547 scopus 로고    scopus 로고
    • H. Ito, W. Oka, H. Goto, H. Umeda, Jpn. J. Appl. Phys. 2006, 45, 4325.
    • H. Ito, W. Oka, H. Goto, H. Umeda, Jpn. J. Appl. Phys. 2006, 45, 4325.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.