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Volumn 13, Issue 5, 2007, Pages 219-226

CVD of metals using alcohols and metal acetylacetonates, Part I: Optimization of process parameters and electrical characterization of synthesized films

(3) Premkumar, Peter Antony a Bahlawane, Naaufal a Kohse Höinghaus, Katharina a

a BIELEFELD UNIVERSITY (Germany)

Author keywords

Alcohols; Liquid delivery; Metal acetylacetonates; Metal films; Pulsed CVD; Resistivity

Indexed keywords

ANNEALING; CARRIER CONCENTRATION; CHEMICAL VAPOR DEPOSITION; COBALT; CONCENTRATION (PROCESS); FILMS; METALLIC FILMS; METALS; NICKEL ALLOYS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REDUCING AGENTS; SILICON CARBIDE; SUBSTRATES;

LIQUID DELIVERY; METAL ACETYLACETONATES; METAL FILMS; PULSED CVD; RESISTIVITY;

COPPER;

EID: 34548864319 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.200606572 Document Type: Article

Times cited : (39)

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