Mechanism of Ni film CVD with a Ni(ktfaa)2 precursor on a copper substrate

Chemical Vapor Deposition

Volumn 11, Issue 2, 2005, Pages 112-117

  Bakovets, Vladimir V ^a   Mithin, Valentin N ^a   Gelfond, Nikolai V ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

Copper substrates; Ni(ktfaa)2 chelate precursor; Nickel films; Thermal analysis

Indexed keywords

ADSORPTION; CATALYSIS; CHELATION; CHEMICAL VAPOR DEPOSITION; DISPERSIONS; MORPHOLOGY; NICKEL COMPOUNDS; PYROLYSIS; THERMOANALYSIS; ULTRAVIOLET SPECTROSCOPY;

CHELATE PRECURSOR; COPPER SUBSTRATES; NI(KTFAA)2; NICKEL FILMS;

THIN FILMS;

EID: 15544388957     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200406317     Document Type: Article

References (30)

1. W. Schwarzacker, Electrochem. Soc. Interface 1999, 8, 20.
2. A. A. Schmidt, H. Eggers, K. Herwig, R. Anton, Surf Sci. 1996, 349, 301.
3. N. S. Borghavkar, G. L. Griffin, H. Fan, A. W. Maverich, J. Electrochem. Soc. 1999, 146, 1041.
4. L. Mond, J. Chem. Soc. 1885, 14, 945.
5. a) L. Brissoneau, C. Vahlas, Chem. Vap. Deposition 1999, 5, 135.
6. b) L. Brissoneau, C. Vahlas, Chem. Vap. Deposition 1999, 5, 281.
7. V. V. Bakovets, M. Z. Graifer, T. M. Levashova, I. P. Dolgovesova, Neorg. Mater. 1995, 31, 222.
8. M. Becht, J. Gallus, M. Hunziker, F. Atamny, K.-H. Dahmen, J. Phys. IV, 1995, C5, 465.
9. V. O. Borisov, V. V. Bakovets, L. F. Bahturova, I. P. Dolgovesova, Neorg. Mater. 1995, 37, 1117.
10. L. Brissonneau, D. De Caro, D. Boursier, R. Madar, C. Vahlas, Chem. Vap. Deposition 1999, 5, 143.
11. C. Vahlas, L. Brissonneau, in CVD Technology. Surface Engineering Series (Eds. J.-H. Park T. S. Sudarshan), Vol. 2, p. 287, ASM International, Materials Park, OH 2001.
12. P. P. Semyannikov, V. M. Grankin, I. K. Igumenov, in Chemical Vapor Deposition (Eds. M. D. Allendorf, C. Bernard), PV 97-25, p. 89, The Electrochemical Society Series, Paris 1997.
13. Powder Diffraction File Alphabetical Index: Inorganic Phases. JCPDS, JCDD. 1023p. 1983.
14. S. L. Cohen, M. Liehr, S. Kasi, Appl. Phys. Lett. 1992, 60, 50.
15. Y. V. Chumachenko, I. K. Igumenov, S. V. Zemskov, Izv. Sib. Otd. Akad. Nauk USSR, Ser. Khim. Nauk 1979, 6, 10.
16. R. Sekine, M. Kawai, Appl. Phys. Lett. 1990, 56, 1466.
17. R. Sekine, M. Kawai, T. Hikita, T. Harada, Surf. Sci. 1991, 242, 508.
18. Thermodynamical Properties of Simple Substances (Ed.: V. P. Glushko), USSR Academy of Sciences, Moscow 1962.
19. F. Teyssandiev, M. D. Allendorf, in Chemical Vapor Deposition-Proc. 14th Int. CVD Conf. and EUROCVD-11 (Eds: M. Allendorf, C. Bernard), The Electrochemical Soc., Pennington NJ, 1997, Vol. 97-25, p. 15.
20. B. M. W. Trapnell, Chemisorption, Butterworths, London 1955.
21. J. L. Whitten, H. Yang, Surf. Sci. Rep. 1996, 24, 59.
22. V. H. Ageev, O. P. Burmistrova, N. D. Potehina, S. M. Solov'yov in, Interaction of Hydrogen with Metals (Ed. A. P. Zaharov), Nauka, Moscow 1987, p. 18.
23. A. Pisarev, V. H. Chernikov in, Interaction of Hydrogen with Metals (Ed. A. P. Zaharov), Nauka, Moscow 1987, p. 233.
24. J. Farkas, K.-M. Chi, M. J. Hampden-Smith, T. T. Kodas, L. H. Dubois, Mater. Sci. Eng. 1993, B17, 93.
25. F. A. Cotton, J. J. Wise, Inorg. Chem. 1967, 6, 917.
26. J. P. Fackler, M. L. Mittlemen, H.Weigold, G. M. Barrow, J. Phys. Chem. 1968, 72, 4631.
27. B. Marciniak, G. E. Buono-core, Inorg. Chem. 1978, 17, 917.
28. R. D. Archer, Inorg. Chem. 1963, 2, 292.
29. E. Tannenbaum, E. M. Coffin, A. J. Harrison, J. Chem. Phys. 1953, 21, 311.
30. V. A. Logvinenko, N. E. Fedotova, I. K. Igumenov, G. V. Gavrilova, J. Therm. Anal. 1988, 34, 259.