Development and qualification of a vacuum pumping system for metalorganic vapor phase epitaxy copper precursors

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2794-2798

  Davis, R P ^a   Abreu, R A ^a  

^a BOC Edwards   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER; ELECTROMIGRATION; METALLORGANIC VAPOR PHASE EPITAXY; SEMICONDUCTOR GROWTH; THIN FILMS; VACUUM PUMPS;

COPPER PRECURSORS; PHYSICAL VAPOR DEPOSITION (PVD);

SEMICONDUCTING FILMS;

EID: 0034315947     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1320805     Document Type: Article

References (11)

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