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Volumn 262, Issue 1-4, 2004, Pages 653-657
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Cobalt (II) β-diketonate adducts as new precursors for the growth of cobalt oxide films by liquid injection MOCVD
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Author keywords
A3. Metalorganic chemical vapor deposition; B1. Cobalt; B1. Metalorganic compounds; B1. Oxides
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
COBALT COMPOUNDS;
DIFFRACTOMETERS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
OXIDATION;
PULSED LASER DEPOSITION;
SAPPHIRE;
SPUTTERING;
SURFACE ROUGHNESS;
SYNTHESIS (CHEMICAL);
VAPOR DEPOSITION;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
LIQUID INJECTION;
PRECURSORS;
ORGANOMETALLICS;
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EID: 0842329933
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2003.10.077 Document Type: Article |
Times cited : (30)
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References (32)
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