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Thin Solid Films

Volumn 320, Issue 1, 1998, Pages 95-102

The carrier gas and surface passivation effects on selectivity in chemical vapor deposition of copper films

(3) Kim, Seok a Park, Jong Man a Choi, Doo Jin a

a Yonsei University (South Korea)

Author keywords

Carrier gas; Copper; CVD; Passivation; Selectivity

Indexed keywords

ALUMINUM; ARGON; COPPER; HYDROGEN; PASSIVATION; SILICA; SUBSTRATES; THIN FILMS; TITANIUM NITRIDE;

CARRIER GAS; SELECTIVITY; SURFACE PASSIVATION;

CHEMICAL VAPOR DEPOSITION;

EID: 0032482026 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)01075-4 Document Type: Article

Times cited : (20)

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