Structural properties of reactively sputtered W-Si-N thin films

Journal of Applied Physics

Volumn 102, Issue 3, 2007, Pages

  Vomiero, A ^a,b   Marchi, E Boscolo ^a   Quaranta, A ^h   Della Mea, G ^h   Brusa, R S ^c   Mariotto, G ^c   Felisari, L ^d   Frabboni, S ^d   Tonini, R ^d   Ottaviani, G ^d   Mattei, G ^e   Scandurra, A ^f   Puglisi, O ^g  

^a LABORATORI NAZIONALI DI LEGNARO   (Italy)

^b INFM   (Italy)

^c UNIVERSITY OF TRENTO   (Italy)

^d UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^e UNIVERSITY OF PADOVA   (Italy)

^f Superlab Consorzio Catania Ricerche   (Italy)

^g UNIVERSITY OF CATANIA   (Italy)

^h NONE

Author keywords

[No Author keywords available]

Indexed keywords

COALESCENCE; CRYSTAL STRUCTURE; MAGNETRON SPUTTERING; PHASE DIAGRAMS; STRUCTURAL PROPERTIES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRICAL RESISTIVITY; METALLIC CLUSTER COALESCENCE; SILICIDE NANOCLUSTERS; TUNGSTEN NITRIDES;

TUNGSTEN COMPOUNDS;

EID: 34548030236     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2761828     Document Type: Article

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