Ternary Ta-Si-N films for sensors and actuators

Sensors and Actuators, A: Physical

Volumn 61, Issue 1-3, 1997, Pages 387-391

  Linder, C ^a   Dommann, A ^a   Staufert, G ^a   Nicolet, M A ^b  

^a Institut für Mikrosystemtechnik   (Switzerland)

^b CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Electromechanical Ta Si N beams; Sputtered Ta Si N films; Surface micromachining

Indexed keywords

ACTUATORS; CRYSTALLIZATION; MICROMACHINING; SENSORS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TERNARY SYSTEMS; X RAY DIFFRACTION ANALYSIS;

ELECTROMECHANICAL BEAMS;

THIN FILMS;

EID: 0031169980     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)80294-4     Document Type: Article

References (8)

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