Amorphous (Mo, Ta, or W)-Si-N diffusion barriers for Al metallizations

Journal of Applied Physics

Volumn 79, Issue 2, 1996, Pages 1109-1115

  Reid, J S ^a,d   Kolawa, E ^a,c   Garland, C M ^a   Nicolet, M A ^a   Cardone, F ^b   Gupta, D ^b   Ruiz, R P ^c  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b IBM RESEARCH   (United States)

^c CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346088307     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.360909     Document Type: Article

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