Bias induced structural changes in tungsten nitride films deposited by unbalanced magnetron sputtering

Materials Science and Engineering: B

Volumn 106, Issue 2, 2004, Pages 172-176

  Guruvenket, S ^a   Rao, G Mohan ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

Bias sputtering; Tungsten nitride; Unbalanced magnetron sputtering

Indexed keywords

CATHODES; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; GLOW DISCHARGES; MAGNETRON SPUTTERING; NITROGEN; PARTIAL PRESSURE; PARTICLE SIZE ANALYSIS; RESIDUAL STRESSES; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

PHASE FORMATION;

THIN FILMS;

EID: 0347604256     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2003.09.016     Document Type: Article

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