Novel thermodynamically stable and oxidation resistant superhard coating materials

Surface and Coatings Technology

Volumn 86-87, Issue PART 1, 1996, Pages 394-401

  Veprek S ^a   Haussmann, M ^a   Reiprich, S ^a   Shizhi, Li ^a,b   Dian, J ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^b QINGDAO UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Plasma CVD; Si3N4; Superhard coatings; TiN; VN; W2N

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRACK PROPAGATION; DISLOCATIONS (CRYSTALS); NANOSTRUCTURED MATERIALS; NITRIDES; OXIDATION RESISTANCE; PHASE SEPARATION; PLASMA APPLICATIONS; THERMODYNAMIC STABILITY; THICK FILMS;

MICROINDENTATION; SUPERHARD COATING; TUNGSTEN NITRIDE; VANADIUM NITRIDE;

COATINGS;

COATINGS; CORROSION RESISTANCE; HARDNESS; THERMODYNAMICS;

EID: 0030483837     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)02988-X     Document Type: Article

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