Microstructure and surface roughness study of highly crystallized μc-Si:H Films

Thin Solid Films

Volumn 515, Issue 19 SPEC. ISS., 2007, Pages 7619-7624

  Ram, Sanjay K ^a   Kumar, Satyendra ^a   Deva, Dinesh ^a   Roca i Cabarrocas, P ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^b LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

Atomic force microscopy (AFM); Ellipsometry; Growth mechanism; Silicon; Structural properties; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; ELLIPSOMETRY; SURFACE ROUGHNESS; THERMAL EFFECTS; THIN FILMS;

GLOW DISCHARGE; GROWTH MECHANISM; SUBSTRATE TEMPERATURES;

METALLIC FILMS;

EID: 34547633705     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.01.034     Document Type: Article

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