SCOPUS 정보 검색 플랫폼

Journal of Non-Crystalline Solids

Volumn 299-302, Issue , 2002, Pages 411-415

Investigations of the electron transport behavior in microcrystalline Si films

(4) Ram, Sanjay K a Kumar, Satyendra a Vanderhaghen, Régis b Cabarrocas, Roca i b

a INDIAN INSTITUTE OF TECHNOLOGY KANPUR (India)

b LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHARGE CARRIERS; ELECTRIC CONDUCTIVITY; ELECTRON TRANSPORT PROPERTIES; ELECTRON TUNNELING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SUBSTRATES; THERMAL EFFECTS;

THERMALLY ACTIVATED CARRIER TRANSPORT;

THIN FILMS;

EID: 0036539107 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(01)00955-3 Document Type: Article

Times cited : (19)

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