메뉴 건너뛰기




Volumn 80-81, Issue , 2001, Pages 237-242

Highly crystalline intrinsic microcrystalline silicon films using SiF4/Ar/H2 glow discharge plasma

Author keywords

Microcrystalline silicon; Plasma deposition; Spectroscopic ellipsometry (SE); Thin film transistor

Indexed keywords

ACTIVATION ENERGY; CRYSTAL GROWTH; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTRON MOBILITY; ELLIPSOMETRY; GRAIN SIZE AND SHAPE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

EID: 0034831964     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper
Times cited : (18)

References (18)
  • 18
    • 84902956267 scopus 로고    scopus 로고
    • Ph.D. Thesis, Ecole Polytechnique, Palaiseau; (unpublished)
    • (2000)
    • Brenot, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.