Structural properties of polycrystalline silicon films having varied textures fabricated with intentional control of surface reactions using SiF4/H2/SiH4 mixing gas

Journal of Non-Crystalline Solids

Volumn 266-269 A, Issue , 2000, Pages 120-124

  Kamiya, T ^a   Nakahata, K ^a   Fortmann, C M ^a   Shimizu, I ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001740608     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00765-6     Document Type: Article

References (8)

1. J. Meier, R. Fluckiger, A. Shah, Appl. Phys. Lett. 65 (1994) 860.
2. J. Meier, S. Dubail, J. Cuperus, U. Kroll, R. Platz, P. Torres, J.A. Anna Selvan, P. Pernet, N. Beck, N.P. Vaucher, Ch. Hof, D. Fischer, H. Keppner, A. Shah, J. Non-Cryst. Solids 227-230 (1998) 1250.
3. S. Ishihara, D. He, T. Akasaka, Y. Araki, I. Shimizu, Mater. Res. Soc. Symp. Proc. 297 (1993) 79.
4. D. He, N. Okada, I. Shimizu, Solar Energy Mater. Solar Cells 34 (1994) 271.
5. M. Nakata, I. Shimizu: Mater. Res. Soc. Symp. Proc. 283 (1993) 591.
6. T. Kamiya, K. Nakahata, A. Miida, C.M. Fortmann, I. Shimizu, Thin Solid Films 337 (1999) 18.
7. T. Kamiya, K. Nakahata, K. Ro, in: C.M. Fortmann, I. Shimizu, Mater. Res. Soc. Symp. Proc. (1999) (accepted for publication).
8. T. Kamiya, K. Nakahata, K. Ro, in: C. M. Fortmann, I. Shimizu, Jpn. J. Appl. Phys. 38 (1999) 5750.