메뉴 건너뛰기




Volumn 24, Issue 1, 2006, Pages 118-130

Modeling extreme ultraviolet/H 2 O oxidation of ruthenium optic coatings

Author keywords

[No Author keywords available]

Indexed keywords

EUV OPTICS; MOLECULAR DIFFUSION; WATER PARTIAL PRESSURE; WATER VAPOR;

EID: 31544472380     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2150225     Document Type: Article
Times cited : (24)

References (19)
  • 7
    • 30244564085 scopus 로고
    • 0167-5729
    • P. A. Thiel and T. E. Madey, Surf. Sci. Rep. 0167-5729 7, 262 (1987); see also, D. L. Doering and T. E. Madey, Surf. Sci. 123, 305 (1982).
    • (1987) Surf. Sci. Rep. , vol.7 , pp. 262
    • Thiel, P.A.1    Madey, T.E.2
  • 8
    • 0001287049 scopus 로고
    • P. A. Thiel and T. E. Madey, Surf. Sci. Rep. 0167-5729 7, 262 (1987); see also, D. L. Doering and T. E. Madey, Surf. Sci. 123, 305 (1982).
    • (1982) Surf. Sci. , vol.123 , pp. 305
    • Doering, D.L.1    Madey, T.E.2
  • 9
    • 84858534318 scopus 로고    scopus 로고
    • Center for X-ray Optics (CXRO) of the Lawrence Berkeley National Laboratory
    • Center for X-ray Optics (CXRO) of the Lawrence Berkeley National Laboratory, http://www-cxro.lbl.gov/optical_constants/
  • 17
    • 31544461667 scopus 로고    scopus 로고
    • Sandia National Laboratories
    • D. Buchenauer, W. M. Clift, K. Williams, and L. E. Klebanoff, status report for International SEMATECH Project LITH 160, Sandia National Laboratories, 2004 (unpublished).
    • (2004)
    • Buchenauer, D.1    Clift, W.M.2    Williams, K.3    Klebanoff, L.E.4
  • 19


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.