Dielectric response of sputtered transition metal oxides

Journal of Applied Physics

Volumn 95, Issue 12, 2004, Pages 8087-8091

  Iosad, N N ^a   Ruis, G J ^a   Morks, E V ^a   Morpurgo, A F ^a   Van Der Pers, N M ^a   Alkemade, P F A ^a   Slvel, V G M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC OXIDATION; CAPACITANCE; DIELECTRIC FILMS; DIELECTRIC PROPERTIES; DOPING (ADDITIVES); ENERGY DISPERSIVE SPECTROSCOPY; ENERGY GAP; FILM GROWTH; INTERFACES (MATERIALS); LIGHT ABSORPTION; QUENCHING; REFRACTIVE INDEX; SPUTTERING; X RAY DIFFRACTION ANALYSIS;

DIELECTRIC RESPONSE; FILM PROPERTIES; HYSTERETIC SPUTTERING; METAL OXIDE METAL STRUCTURES;

TRANSITION METAL COMPOUNDS;

EID: 3142599537     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1712008     Document Type: Article

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