Synchrotron X-ray scattering and reflectivity studies of the structure of low dielectric constant SiOCH thin films prepared from bistrimethylsilylmethane by chemical vapor deposition

Journal of Applied Crystallography

Volumn 40, Issue SUPPL. 1, 2007, Pages

  Heo, Kyuyoung ^a   Oh, Kyoung Suk ^b   Yoon, Jinhwan ^a   Jin, Kyeong Sik ^a   Jin, Sangwoo ^a   Choi, Chi Kyu ^b   Ree, Moonhor ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Jeju National University   (South Korea)

Author keywords

Bistrimethylsilylmethane precursor; Grazing incidence X ray scattering; Low dielectric constant SiOCH dielectric film; Specular X ray reflectivity

Indexed keywords

EID: 34248402941     PISSN: 00218898     EISSN: 16005767     Source Type: Journal    
DOI: 10.1107/S0021889806054124     Document Type: Conference Paper

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